historia de nos
ENSINO FUNDAMENTAL, MÉDIO E PROFISSIONALIZANTE
HUGO JHONATHAN DA SILVA
FABRICAÇÃO DE MICROPROCESSADORES
SARANDI
2014
Extraction of Silicon for the manufacture of microprocessors
Silicone is the second chemical in the earth's crust by dispersion.
Quartz is usually mined from natural deposits.
Metallurgical silicon is obtained in an arc furnace at the average temperature of 1800 C.
Trichlorosilane is obtained by chlorination of silicon at the temperature of 260-400 degrees.
Purification of TCS from admixtures (boron, phosphorous, carbon) is conducted via rectification.
Polysilicon crystalline is obtained by depositing and crystallizing polysilicon from various gaseous silanes at heated silicon filaments in the hydrogen atmosphere inside CVD reactors.
UM filament quality determines the grade of deposited polysilicon and the success rate of the deposition process.
Polysilicon ingot is fixed in a loading chamber. Then it is brought to the inductor, where it is heate to the melting temperature.
Melted silicon is placed on a quartz drawhole. The seed rod made of polycrystalline silicon is delivered into the melt through a chilling bath and a hole from below the chamber.
The mobile mechanism draws the seed with the melted silicon down during a continuous production process. Two filaments can be simultaneously obtained from a single ingot.
Our unique method allows for filling the obtained UM filament with thermodonors, that gives is the resistivity shown in the table without deteriorating the end product's quality.
TRADUÇÃO
Extração de Silício para a fabricação de microprocessadores
Silicone é o segundo produto químico na crosta terrestre por dispersão.
Quartzo é geralmente extraído de depósitos naturais.
Silício metalúrgico é obtido em uma fornalha de arco, a temperatura média de 1800 C.
Triclorosilano é obtido pela cloração do silício à